TELIC

Chrome Photomask Blanks/Standard

Substrates:

Applications:

- SODA LIME
- BOROSILICATE (1737, D263, BOROFLOAT)
- WHITE CROWN (B-270, BK-7)
- QUARTZ ( SYNTHETIC FUSED SILICA)

- RETICLES, MASTER GRADE
- PRINT & TEST GRADE

Substrate Specification

SIZE:

Squares: 2" through 7"

THICKNESS:

0.020'' - 0.220'' (0.5mm - 6mm) (non standard thickness upon request)

SURFACE:

All plates polished on both sides & inspected
to be free of glass defects > 2&microm

FLATNESS:

Master Grade: < 5 µ m
Print Grade: &lt15 µ m

Film Specification

CHROME:

Vacuum Deposited, DC Sputtered in Class 100 Environment

THICKNESS/
OPTICAL DENSITY:

Standard: 1200ű 10% /O.D.=3.0&plusmn0.3 @ 430mm.
Custom Thicknesses up to 5 µ m

REFLECTIVITY:

 

CHROME

LOW

<12% @ 400nm

MID

<33% @400nm

HI

<55% @400nm

PROCESS:

Etchable in all conventional Wet Etch systems.
Plasma Grade recommended for Dry Etch systems

PHOTORESIST:

Shipley 1800 or AZ 1500 filtered to 0.2 micron at point of use. All widely used positive and negative optical and E-beam resist available
Telic Company
24832 Avenue Rockefeller
Valencia, CA 91355
 		Phone: 661.702.8603
 Toll Free: (888) TELICCO
 Fax: 661.257.6802
 E-mail: telic2000@aol.com
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