TELIC

Photomask Blanks/Aluminum

Substrates:

Applications:

- QUARTZ (SYNTHETIC FUSED SILICA)

- LASER ABLATION MASKS

Substrate Specification

SIZE:

Squares: 2" through 7"

THICKNESS:

0.090'' - 0.250'' (non standard thickness upon request)

SURFACE:

All plates polished on both sides & inspected
to be free of glass defects > 5&microm

FLATNESS:

Master Grade: < 5 µ m
Master Grade: < 2 µ m

Film Specification

ALUMINIUM:

Vacuum Deposited, DC Sputtered in Class 100 Environment

THICKNESS/
OPTICAL DENSITY:

Standard: 1200Å /O.D.=3.0&plusmn0.3 @ 430nm. Custom Thickness up to 5 µ m

REFLECTIVITY:

> 85%

PHOTORESIST:

Shipley 1800 or AZ 1500, 895i, PBS filtered to 0.2 micron at point of use. All widely used positive and negative optical and E-beam resist available.

Telic Company
24832 Avenue Rockefeller
Valencia, CA 91355

Phone: 661.702.8603
Toll Free: (888) TELICCO
Fax: 661.257.6802
E-mail: telic2000@aol.com